This work presents ITO-free electrochromic films using AgNW networks as a transparent electrode. The AgNW networks are deposited through spray-coating on transparent glass substrates, afterward, the electrochromic material is deposited using radio frequency magnetron sputtering, spin, or spray coatings. The electrochromic performance of materials, like vanadium pentoxide, tungsten trioxide, SurMOF, and PEDOT:PSS, deposited on AgNWs are presented using cyclic voltammetry and chronoamperometry. The switching kinetics of AgNWs-based electrochromic films is studied by in-situ optical measurement and compared with the ITO-based films. As an example, the switching time of RF-sputtered V₂O₅ films is reduced by half when replacing the ITO substrate with AgNW-based substrate.