One way to increase the lifetime of metallic interconnectors of electrolysis cells is the application of protective coatings. In this work M_n+1AX_n phase coatings, Ti₂AlN and Ti₂AlC were deposited on Crofer22APU substrates using a multilayer physical vapor deposition with a subsequent annealing in vacuum. A modified MAX-Phase (TiZr)₂AlC was also deposited with the use of a composite TiZr-Target. Thereby, dense and single-phase Ti₂AlN and Ti₂AlC coatings were synthesized.

A subsequent annealing in humid air at 850°C for 100 h was performed and the chromium evaporation rate was recorded to investigate the potential suitability of MAX phase coatings as barrier material. The results are compared to galvanic lanthanum oxide barrier coatings.