FEMS EUROMAT 2023
Poster
Structural and electrical properties of KTN heterolayer thin films prepared by the chemical solutionl deposition
SL

Prof. Sunggap Lee

Gyeongsang National University

Lee, S. (Speaker)¹; Lee, M.¹; Lee, S.¹; Park, B.¹; Park, J.²
¹Gyeongsang National University, Jinju (South Korea); ²Korea Institute of Ceramic Engineering and Technology, Jinju (South Korea)

In this study, K(Ta0.70,Nb0.30)O3/K(Ta0.55,Nb0.45)O3 heterolayer thin films fabricated by the chemical solution deposition and the spin coating method. As a rusult of XRD, pyrochlore phase was observed in all specimens, but the intensity ratio of its decreased as the number of coatings increased. All KTN heterolayer films represented a pseudo-cubic structure with a lattice constant of approximately 0.3982-0.3988 nm. As a result of SEM anlysis, the average thickness of one layer was about 70 nm, and the grain size was approximately 130 nm regardless of the number of coatings. The KTN heterolayer thin films had better dielectric properties than the monolayer KTN(70/30) or KTN(55/45) thin films, and its properties had been improved as the number of coatings increased. The phase transition temperature of the KTN heterolayer thin film coated 6-times was approximately 40℃. Its electrocaloric coefficient(ΔT) was 1.93 K, and the efficiency(ΔT/ΔE) was 12.8 mKcm/kV.

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