We introduce a novel material system as a new photoresin. It consists of prepolymers carrying functional moieties that can be activated by UV light (365 nm) or near-infrared light (780 nm), then react with aliphatic groups in neighboring macromolecules via C,H-insertion crosslinking (CHic) to form a crosslinked network. Photopatterning through digital light processing (DLP) and 3D structuring through two-photon lithography (2PL) of such materials were described as examples.