Thin films based on Ti-Zr alloys have been the subject of extensive studies for various applications and are very promising in the aerospace and biomedical fields due to their adequate properties. In this work, Ti-Zr thin films were deposited on silicon substrates through the magnetron sputtering technique in metallic mode (60 sccm argon flow), combining the High Power Impulse Magnetron Sputtering (HiPIMS) and Direct Current Magnetron Sputtering (DCMS), applied on Zr and Ti targets respectively. A constant power of 150 W was used for both sources that worked simultaneously, and the pulse width in the HiPIMS was different in each deposition (from 50 µs to 200 µs), while the frequency was maintained at 600 Hz. The samples were characterized using XRD, profilometry, and nanoindentation to evaluate the morphological properties of the films. Two crystalline peaks belonging to Ti-Zr alloys were identified by XRD from all samples. The preferential orientation in the plane (002) and (200) has lower intensity. Furthermore, these peaks are associated with the α-phase titanium alloy. The thicknesses of the films increased from the sample produced at 50 µs to 200 µs. The sputter yield in HiPIMS processes is complex and involves numerous factors such as type of ions, electron density, composition of neutral and self-sputtered ionized atoms, and working gas recycling. A lower current and a higher thickness in 200 µs are typical of metallic mode sputtering. The hardness (Hit) from 6.4 to 8.2 GPa and elastic modulus (Eit) between 103 and 109 GPa were obtained in samples deposited by pulse width from 50 µs to 200 µs. These elastic moduli were inferior to the thin films produced by M.G. Rodríguez-Hernández, which measured 181 GPa, probably influenced by ω-phase. An additional sample using 250 µs of pulse width in the HiPIMS was also made, which presented the greatest hardness value (16 GPa) and elastic modulus (195 GPa) as well as a high standard deviation.