Analyzing the aspect of corrosion resistance in the literature and alongside our results, it can be concluded that the use of typically inorganic sol-gel materials, in terms of corrosion protection, is highly ineffective. The results that we have obtained by conducting potentiodynamic polarization tests clearly indicate the advantage of organically modified sol-gel materials. Polarization resistance (Rp) of 3,965 kΩ /cm2 was obtained for SiO2 layers based on tetraethoxysilane, while the same matrix modified with the precursor 1H,1H,2H,2H-perfluorocyltriethoxysilane made it possible to obtain materials with a Rp of 3975 kΩ/cm2 (in 0.5M NaCl), i.e. which is more than a thousand-fold improvement compared to the undoped native coating.

Also, more and more emphasis is being placed on extending the life of sol-gel materials operating under degrading conditions, such as atmospheric, marine and industrial environments [3], [4]. In tackling this problem, scientists are developing novel materials with the ability to "self-heal" [2], [5]. Two ways are currently known to modify sol-gel materials to impart "self-healing" properties:
- modification of matrices containing organic groups at the stage of synthesis by salts or other reagents,
- utilizes nanopowders, or nanocontainers with active substances.
One of active agent can be CeO2 which contributes to an increase of the barrier properties of coatings, as well as the improvement of their stability during exposure to degradation factors.

There remains a need for improvement in the mechanical properties of sol-gel matrices, which are insufficiently resistant to mechanical stresses in corrosive conditions.

We present a "holistic" approach to the production of the layer on a substrate as a whole in the context of improving the corrosion resistance of metallic construction materials under conditions of static and cyclic mechanical loads. Moreover, we also present the results of research on sol-gel thin silica films on metallic substrates, carried out using techniques not previously used for thin films.