Leibniz-Institut für Plasmaforschung und Technologie e.V.
An innovative plasma-based combination process of HiPIMS (High Power Impulse Magnetron Sputtering) and PbII (Plasma based Ion Implantation) deposition techniques was applied to produce photo- hydrophilic and photo-catalytic TiO2 surfaces on various materials (glass, titanium, stainless steel and PEEK) to avoid initial microbial adhesion and biofilm formation. The properties of deposited films were characterized, physicochemical investigations as well as micriobiological tests were carried out.
Abstract
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Poster
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