FEMS EUROMAT 2023
Lecture
06.09.2023 (CEST)
Atomic layer deposition of Ti-MIL-125-like metal-organic-framework thin films towards hydrogen evolution photocatalysts in water splitting
JR

Dipl.-Ing. Jakob Rath

Technische Universität Wien

Rath, J. (Speaker)¹
¹Technical University Vienna
Vorschau
19 Min. Untertitel (CC)
Metal-organic-frameworks (MOFs) exhibit unique properties such as enormous specific surface areas and high porosities, leading to a wide range of possible applications, incl. heterogeneous (photo-)catalysis, gas separation/storage, water purification, and (opto-)electronic devices. Historically, MOF synthesis is based on wet-chemical techniques, which are however limited when wanting to deposit MOFs as thin films of ultra-low thickness on complex three-dimensionally shaped substrates. Thus, recently, various gas-phase approaches for MOF thin films have emerged, incl. chemical vapor deposition (CVD) or atomic layer deposition (ALD), promising precise thickness control down to Å-resolution, very high interface-quality, and intrinsic conformal coating of complex-shaped 3D substrates, albeit often at the cost of limited MOF crystallinity. We here report the deposition of Ti-MIL-125 MOF films by ALD. Notably, we find that our ALD MOF films show clear signs of Ti-MIL-125 structure in Raman spectroscopy, while the films appear amorphous in X-ray diffractometry (XRD) (i.e. are “XRD-amorphous”). Consequently, we assign to our ALD MOF films limited short range order and therefore label them as ALD “Ti-MIL-125-like” MOF films (in analogy to “diamond-like-carbon”). We demonstrate that we can deposit the Ti-MIL-125-like ALD MOF films not only on planar Si wafer substrates but also on nanoscaled ~200 nm diameter SiO2 nanoparticles, thus forming core-shell nanostructures with ALD Ti-MIL-125-like MOF shells. Finally, we also explore the potential of these ALD Ti-MIL-125-like MOF films as photocatalysts for the hydrogen evolution reaction (HER) in photocatalytic water splitting.
Abstract

Abstract

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