One of the main challenges currently encountered in focused electron (FEBID) and ion beam induced deposition (FIBID) is the availability of suitable precursor molecules for desired material compositions.[1] Besides the deposition of single metal deposits, the deposition of binary materials with defined stoichi-ometry is very challenging. An attractive approach to simplify the challenging task for metal silicides is the use of heterometallic precursors which already possess the desired constituent stoichiometry. This con-tribution compares two precursors for the FEBID/FIBID deposition of CoSix-based materials of predefined composition, H₃SiCo(CO)₄ and H₂Si(Co(CO)₄)₂.  
Compositional analysis via EDX shows significant differences in the FEBID and FIBID-derived materials. FEBID yields deposits with intermediate Co + Si contents of ~55-60 at% for both precursors under reten-tion of the Co:Si ratio predefined in the precursor molecules.[2] In contrast, FIBID derived deposits show a significantly higher metal content of up to 87 at%. However, influences on compositional variations in FIBID can be observed and explained by process-related fundamentals.[3] In addition, the influence of temperature cycling during FEBID and post deposition treatments will be discussed.


[1] S. Barth, M. Huth, F. Jungwirth;  J. Mater. Chem. C 2020, 8, 15884.
[2] F. Jungwirth, F. Porrati, A. G. Schuck, M. Huth, S. Barth; ACS Appl. Mater. Interf. 2021 13, 48252.
[3] F. Jungwirth, F. Porrati, D. Knez, H. Plank, M. Huth, S. Barth;  ACS Appl. Nano Mater. 2022, 5, 14759.