The joint use of nano-indentation and AFM is widely used for nano-mechanical characterization for a wide range of materials. A common problem is to spatially correlate the complementary analytical data obtained by the two methods, since the two experiments are usually done at separate instruments. Hence, finding exactly the same position on the sample in both instruments is crucial, yet very time-consuming and difficult, if possible at all.

To overcome these problems in correlated analysis, we developed a completely new tabletop system, where the nano-indenter tip and the cantilever tip of the AFM are at fixed positions at a distance of less than 20mm. Due to the dedicated AFM-scanner design employing a new type of cantilever with integrated strain sensors it was possible to integrate a nano-indenter, the AFM scanner, an optical microscope and a sample stage in a compact microscopy head.

With this nanomechanical microscope the operator can decide on the sequence of indentation, scratch or surface analysis experiments (e.g. topography, conductive or KPFM) at different point(s) of interest (PoI) on the sample. The spatial correlation and automated sample movement empowers the operator to perform multiple measurements - experiments can be repeated on exactly the same position, with intermediate application of the second method or even experiments on other PoI’s.

In our presentation we will demonstrate the benefits of correlated analysis with our new nanomechanical microscope on various samples like high speed steel or multilayer semiconductors.

Dr. Ernest J. Fantner